| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To detect the presence or absence of a mask defect by comparing two detected images in a mask inspection apparatus. <P>SOLUTION: The mask inspection apparatus includes: an illumination optical system 2 that irradiates a mask 200 having a predetermined pattern formed thereon with a laser beam as illumination light in a deep UV ray region emitted from a light source 1; two TDI (time delay and integration) sensors 11 and 12; two imaging optical systems that simultaneously and separately image the light from different detection object regions in the illuminated region of the mask 200 irradiated with the illumination light onto the two TDI sensors 11 and 12; an image magnification-correcting means that controls sizes of the two images detected through the two TDI sensors 11 and 12 to match each other; and a signal processing system 20 that detects a defect in the mask 200 based on the two images having sizes conformed to each other by the image magnification correcting means. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
