发明名称 METHOD OF MANUFACTURING SUBSTRATE FOR LIQUID DISCHARGE HEAD
摘要 <p>Provided is a method of manufacturing a substrate for a liquid discharge head including a first face, energy generating elements which generate the energy to be used to discharge a liquid to a second face opposite to the first face, and liquid supply ports for supplying the liquid to the energy generating elements. The method includes preparing a silicon substrate having, at the first face, an etching mask layer having an opening corresponding to a portion where the liquid supply ports are to be formed, and having first recesses provided within the opening, and second recesses provided in the region of the second face where the liquid supply ports are to be formed, the first recesses and the second recesses being separated from each other by a portion of the substrate; and etching the silicon substrate by crystal anisotropic etching from the opening of the first face to form the liquid supply ports.</p>
申请公布号 WO2011027645(A1) 申请公布日期 2011.03.10
申请号 WO2010JP63234 申请日期 2010.07.29
申请人 CANON KABUSHIKI KAISHA;WATANABE, KEIJI;KOYAMA, SHUJI;ABO, HIROYUKI;MATSUMOTO, KEIJI 发明人 WATANABE, KEIJI;KOYAMA, SHUJI;ABO, HIROYUKI;MATSUMOTO, KEIJI
分类号 B41J2/16;B41J2/045;B41J2/055 主分类号 B41J2/16
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