发明名称 PHASE CHANGE MEMORY DEVICE HAVING DIELECTRIC LAYER FOR ISOLATING CONTACT STRUCTURE FORMED BY GROWTH, SEMICONDUCTOR DEVICE HAVING THE SAME, AND METHODS FOR MANUFACTURING THE DEVICES
摘要 A phase change memory device includes a semiconductor substrate having an impurity region and an interlayer dielectric applying a tensile stress formed on the semiconductor substrate and having contact holes exposing the impurity region. Switching elements are formed in the contact holes; and sidewall spacers interposed between the switching elements and the interlayer dielectric and formed as a dielectric layer applying a compressive stress.
申请公布号 US2011059591(A1) 申请公布日期 2011.03.10
申请号 US20100949275 申请日期 2010.11.18
申请人 HYNIX SEMICONDUCTOR INC. 发明人 CHANG HEON YONG
分类号 H01L21/62;H01L21/768 主分类号 H01L21/62
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