| 摘要 |
<P>PROBLEM TO BE SOLVED: To high accurately perform a calibration of an optical characteristic measuring device by arranging a measurement system of the optical characteristic measuring device on an object surface side of an optical projection system. <P>SOLUTION: This invention relates to a wave front aberration measuring device 20 of the optical projection system PL, and is equipped with: a test reticle R1 having an opening 19 for measurement; a measurement system 21 which measures a wave front of the optical projection system PL by passing through the opening 19 for measurement and the optical projection system PL and by receiving illumination light returned from an image plane through the optical projection system PL; a reflective diffusion spherical surface 24 illuminating a region containing the opening 19 for measurement, which can be attachably and detachably arranged in an optical path of an illumination light IL and reflects the illumination light passing through the opening 19 for measurement; and a measuring section 17 seeking for a wave front of the measurement system 21 by receiving a measuring light passing through the opening 19 for measurement, with the measurement system 21. <P>COPYRIGHT: (C)2011,JPO&INPIT |
