发明名称 METHOD FOR FORMING METAL OXIDE FILM, METAL OXIDE FILM AND APPARATUS FOR FORMING METAL OXIDE FILM
摘要 A method for forming a metal oxide film, which can further improve the production efficiency while maintaining low resistivity of a metal oxide film formed thereby.  The method for forming a metal oxide film comprises the following steps: a step wherein a solution (4) containing a metal element and ethylenediamine (4a) is formed into a mist; a step wherein a substrate (2) is heated; and a step wherein the mist of the solution (4) obtained in the above-mentioned step is supplied to a first major surface of the substrate (2) which has been heated in the above-mentioned heating step.
申请公布号 WO2011027425(A1) 申请公布日期 2011.03.10
申请号 WO2009JP65314 申请日期 2009.09.02
申请人 TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION;KYOTO UNIVERSITY;ORITA HIROYUKI;SHIRAHATA TAKAHIRO;YOSHIDA AKIO;FUJITA SHIZUO;KAMEYAMA NAOKI;KAWAHARAMURA TOSHIYUKI 发明人 ORITA HIROYUKI;SHIRAHATA TAKAHIRO;YOSHIDA AKIO;FUJITA SHIZUO;KAMEYAMA NAOKI;KAWAHARAMURA TOSHIYUKI
分类号 C23C18/12;B05D3/02;H01L21/288 主分类号 C23C18/12
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