发明名称 |
METHOD FOR FORMING METAL OXIDE FILM, METAL OXIDE FILM AND APPARATUS FOR FORMING METAL OXIDE FILM |
摘要 |
A method for forming a metal oxide film, which can further improve the production efficiency while maintaining low resistivity of a metal oxide film formed thereby. The method for forming a metal oxide film comprises the following steps: a step wherein a solution (4) containing a metal element and ethylenediamine (4a) is formed into a mist; a step wherein a substrate (2) is heated; and a step wherein the mist of the solution (4) obtained in the above-mentioned step is supplied to a first major surface of the substrate (2) which has been heated in the above-mentioned heating step. |
申请公布号 |
WO2011027425(A1) |
申请公布日期 |
2011.03.10 |
申请号 |
WO2009JP65314 |
申请日期 |
2009.09.02 |
申请人 |
TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION;KYOTO UNIVERSITY;ORITA HIROYUKI;SHIRAHATA TAKAHIRO;YOSHIDA AKIO;FUJITA SHIZUO;KAMEYAMA NAOKI;KAWAHARAMURA TOSHIYUKI |
发明人 |
ORITA HIROYUKI;SHIRAHATA TAKAHIRO;YOSHIDA AKIO;FUJITA SHIZUO;KAMEYAMA NAOKI;KAWAHARAMURA TOSHIYUKI |
分类号 |
C23C18/12;B05D3/02;H01L21/288 |
主分类号 |
C23C18/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|