发明名称 |
METHOD OF FORMING PATTERN |
摘要 |
PURPOSE: A method for forming patterns is provided to protect a material forming the patterns from external effect using a substrate with nano scale concave-convex and a simple coating method. CONSTITUTION: A photosensitive material(12) is coated on the entire surface of a substrate(11) to form a photosensitive material layer through a spin coating method. A nano scale concave-convex is formed on a region of the photosensitive material layer on which a pattern is to be formed through one method selected from a group including a laser interference method, a photolithography method, and a nano imprint method. The region with the nano scale concave-convex is coated with a solution(21).
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申请公布号 |
KR20110025354(A) |
申请公布日期 |
2011.03.10 |
申请号 |
KR20090083374 |
申请日期 |
2009.09.04 |
申请人 |
LG CHEM. LTD. |
发明人 |
KIM, TAE SU;KIM, JAE JIN;SHIN, BU GON;YU, MIN A |
分类号 |
B82B3/00;H01L21/027 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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