发明名称 RESIN COMPOSITION FOR INSULATING FILM OR SURFACE-PROTECTIVE FILM OF ELECTRONIC COMPONENTS, METHOD FOR PRODUCING PATTERN-CURED FILM AND ELECTRONIC COMPONENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a resin composition capable of forming an interlayer insulating film or a surface protection film without occurrence of melt at the final heating step and with smaller sublimation of the cross-linking component and the like, and with smaller generation of gas component at the heating after the final heating step. <P>SOLUTION: The resin composition for an insulating film or a surface-protective film of electronic components includes: (A) a polymer having a structural unit shown by formula (I), and an acidic functional group or a group derived therefrom at both of the terminals; (B) a solvent; and (C) a specific ureido compound; wherein X<SB>1</SB>is a di- octa-valent organic group, Y<SB>1</SB>is a di- octa-valent organic group, R<SB>1</SB>is H or a 1-20C organic group, R<SB>2</SB>is H or a monovalent organic group, when a plurality of R<SB>1</SB>s or R<SB>2</SB>s exist, the plurality of R<SB>1</SB>s or R<SB>2</SB>s may be the same or different, p and q are independently an integer of 0-4, l and m are independently an integer of 0-2, and n is an integer of &ge;2 indicating the number of structural units in the polymer. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011046918(A) 申请公布日期 2011.03.10
申请号 JP20100100736 申请日期 2010.04.26
申请人 HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD 发明人 NAKANO HAJIME
分类号 C08G73/10;G03F7/004;G03F7/023;G03F7/40;H01L21/027 主分类号 C08G73/10
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