| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce the whole time required for an exposure process of a workpiece and to prevent decrease in the throughput in a double-sided exposure apparatus having a mask library. <P>SOLUTION: A workpiece W conveyed to a workpiece carry-in and carry-out part 20 is conveyed to a work stage 4, and the workpiece W is exposed to transfer a pattern formed on a mask for exposure of a first face (top face), the mask extracted from a mask library 6. The workpiece W is inverted (reversed) in an inverting stage part 30 and stored in a workpiece storage part 40. First faces (top faces) of the all workpieces in one lot are exposed in the same way. Subsequently, the mask is exchanged with a mask for exposure of a second face (back face). A workpiece with exposed first face is extracted from the workpiece storage part 40, and the second face (back face) of the workpiece is exposed. The workpiece W after exposure of the back face is conveyed by the first workpiece conveying mechanism 50b to the workpiece carry-in and carry-out part 20. <P>COPYRIGHT: (C)2011,JPO&INPIT |
