| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To uniformize an etching rate within a plane of a light-shielding film regardless of the figure of a transfer pattern, to improve the quality of a multi-gradation photomask, and to improve the production yield. <P>SOLUTION: The multi-gradation photomask has a predetermined transfer pattern including a light-shielding part, a light-transmitting part and a translucent part formed on a transparent substrate, wherein the light-shielding part comprises an etching balancer film having conductivity, a translucent film and a light-shielding film layered in this order on the transparent substrate, the translucent part comprises the etching balancer film and the translucent film layered in this order on the transparent substrate, and the light-transmitting part comprises an exposed part of the transparent substrate. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
