发明名称 SEMICONDUCTOR DEVICE
摘要 A semiconductor device including a substrate, an epitaxial layer, a first sinker, a transistor, a diode unit, a first buried layer, and a second buried layer is provided. When the semiconductor device is operated at the high voltage, the highly large substrate current due to the external load is avoided through the diode unit disposed in the semiconductor device of an embodiment consistent with the invention. Furthermore, according to the design of the semiconductor device, the issue of the narrow input voltage range is improved, and interference of the semiconductor device with the other semiconductor devices is prevented.
申请公布号 US2011057262(A1) 申请公布日期 2011.03.10
申请号 US20090557495 申请日期 2009.09.10
申请人 EPISIL TECHNOLOGIES INC. 发明人 MA SHIH-KUEI;KUO TA-CHUAN
分类号 H01L27/06 主分类号 H01L27/06
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