PROCESS AND APPARATUS FOR CONTROLLING COATING DEPOSITION

摘要

Method and apparatus for controlling a coating deposition process, where at least at one stage of the coating deposition process at least one of the coating precursors comprises a gas, a vapour or an aerosol. The method comprises monitoring ultrafine particles and adjusting at least one process parameter based on the monitoring. The apparatus comprises means (13) for monitoring ultrafine particles and means (14) for adjusting at least one process parameter based on the monitoring.