| 摘要 |
PROBLEM TO BE SOLVED: To provide a cutting tool according to a method of depositing a crystallineα-Al<SB>2</SB>O<SB>3</SB>layer on a cutting tool insert by means of chemical vapor deposition at a temperature of 625-800°C. SOLUTION: The method includes processes of: depositing a TiC<SB>X</SB>N<SB>Y</SB>O<SB>Z</SB>layer of 0.1-1.5μm, where X+Y+Z≥1 and Z>0 or preferably Z>0.2; treating the layer at 625-1,000°C in a short time of approximately 0.5-4 minutes in the presence of optionally 0.5-6 vol% HCl preferably in a gas mixture containing CO<SB>2</SB>and H<SB>2</SB>, or O<SB>2</SB>and H<SB>2</SB>; and depositing the Al<SB>2</SB>O<SB>3</SB>layer by bringing the above treated layer into contact with a gas mixture containing 2-10 vol% AlCl<SB>3</SB>and 16-40 vol% CO<SB>2</SB>in H<SB>2</SB>and with an agent, preferably H<SB>2</SB>S, containing 0.8-2 vol% sulfur, at a treatment pressure of 40-300 millibars and a temperature of 625-800°C. The present invention includes the cutting tool insert having at least a single-layer film of theα-Al<SB>2</SB>O<SB>3</SB>layer. COPYRIGHT: (C)2011,JPO&INPIT |
