发明名称 INORGANIC STRUCTURE, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING INORGANIC THIN FILM
摘要 Disclosed is a method for producing an inorganic structure, which comprises a step of preparing a material for an inorganic structure, and a water vapor treatment step in which the water droplet falling angle of the surface of the material for an inorganic structure is decreased by subjecting the material for an inorganic structure to a water vapor treatment.
申请公布号 WO2011027872(A1) 申请公布日期 2011.03.10
申请号 WO2010JP65177 申请日期 2010.09.03
申请人 THE UNIVERSITY OF TOKYO;TOKYO INSTITUTE OF TECHNOLOGY;KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY;WATANABE, TOSHIYA;YOSHIDA, NAOYA;YOKONISHI, RYOSUKE;IMAI, TAKAAKI;OKURA, TOSHINORI;YOKOTA, YUKINOBU;CHEN, CHANGCHUAN;SHIBAYAMA, YUKO;NAKAJIMA, AKIRA;FURUTA, TSUTOMU 发明人 WATANABE, TOSHIYA;YOSHIDA, NAOYA;YOKONISHI, RYOSUKE;IMAI, TAKAAKI;OKURA, TOSHINORI;YOKOTA, YUKINOBU;CHEN, CHANGCHUAN;SHIBAYAMA, YUKO;NAKAJIMA, AKIRA;FURUTA, TSUTOMU
分类号 C01G25/02;B01J21/06;B01J35/02;B01J37/08;B01J37/10;C01B33/12;C01F7/02;C01F17/00;C01G23/00;C01G23/04;C01G25/00;C01G27/00;C01G27/02;C03C17/25 主分类号 C01G25/02
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