| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming method which can form a film with high accuracy in a shortened process period of time, and to provide an EB-PVD apparatus. SOLUTION: The film-forming method is a method of forming the film by depositing particles vaporized from an evaporation source 3 onto an article to be film-formed, and includes the steps of: acquiring data of a calibration curve that shows a relationship between a relative reflectance of the formed film based on the reflectance of the article to be film-formed, which has been measured by using a light with a predetermined wavelength, and the change of the film thickness of the formed film; measuring the relative reflectance by making the light incident on and reflect from the formed film; calculating the film thickness of the formed film from the data of the calibration curve and the measured relative reflectance; and feeding back the film thickness obtained by the calculation to the control of the film thickness of the formed film. COPYRIGHT: (C)2011,JPO&INPIT
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