发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A plurality of conductive layers are stacked in a first region and a second region. A semiconductor layer is surrounded by the conductive layers in the first region, includes a columnar portion extending in a perpendicular direction with respect to a substrate. A charge storage layer is formed between the conductive layers and a side surface of the columnar portion. The conductive layers includes first trenches, second trenches, and third trenches. The first trenches are arranged in the first region so as to have a first pitch in a first direction. The second trenches are arranged in the second region so as to have a second pitch in the first direction. The third trenches are arranged in the second region so as to have a third pitch in the first direction and so as to be sandwiched by the second trenches.
申请公布号 US2011057250(A1) 申请公布日期 2011.03.10
申请号 US20100874869 申请日期 2010.09.02
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 HIGASHI KAZUYUKI
分类号 H01L29/792 主分类号 H01L29/792
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