| 摘要 |
Provided are 1) a polymer which is excellent in a reactivity to acid and a heat stability and which is less swollen in developing, 2) a compound shown below which is a raw material for the above polymer and 3) a photoresist composition which contains the above polymer and which is improved in LWR and excellent in a heat resistance. (wherein n represents an integer of 0 to 2; R1 represents a hydrogen atom, methyl or the like; R2 to R10 each represent independently a hydrogen atom, a linear alkyl group, a branched alkyl group or the like; and A and B each represent independently an oxygen atom or a sulfur atom).
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