发明名称 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE AND METHOD FOR FORMING LITHOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide: a photosensitive composition which enables direct writing with a solid laser, a semiconductor laser and the like emitting infrared radiation and has excellent storage stability and burning smear resistance; a photosensitive lithographic printing plate; and a method for forming a lithographic printing plate. <P>SOLUTION: The photosensitive composition contains: an alkali-soluble resin; an infrared absorbent; and an antioxidant, wherein the antioxidant is preferably a phosphorous ester-based compound or a mercaptoimidazole-based compound. Preferably, the photosensitive composition further contains a cyclic acid anhydride. In the photosensitive lithographic printing plate, a photosensitive layer comprising the photosensitive composition is formed on a support. The method for forming a lithographic printing plate includes subjecting the photosensitive layer of the photosensitive lithographic printing plate to image exposure with actinic rays of &ge;700 nm wavelength, and removing an exposed area by dissolution in an alkaline developer. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011048382(A) 申请公布日期 2011.03.10
申请号 JP20100223439 申请日期 2010.10.01
申请人 KODAK JAPAN LTD 发明人 YUNO MARU
分类号 G03F7/004;G03F7/00 主分类号 G03F7/004
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