PHOTOCROSSLINKABLE POLYROTAXANE, COMPOSITION CONTAINING THE PHOTOCROSSLINKABLE POLYROTAXANE, AND CROSSLINKED MATERIAL DERIVED FROM THE COMPOSITION, AS WELL AS METHOD FOR MANUFACTURING THEM

摘要

PROBLEM TO BE SOLVED: To provide a photocrosslinkable polyrotaxane which has the scratch resistance and low hysteresis loss; a composition and the like containing the photocrosslinkable polyrotaxane; and a crosslinked material from their compositions; as well as a method for manufacturing those. SOLUTION: The photocrosslinkable polyrotaxane is such that a cyclic molecule of a polyrotaxane is placed with blocking groups at the both ends of such a pseudopolyrotaxane for the below cyclic molecule so as not to eliminate, as an open part of the cyclic molecule is at a skewering shape included with a straight molecule, and has a group expressed by the formula: -M-Y (wherein, M is expressed by formula II, X is a 1-8C straight alkylene group; n is a mean value of 1-10; and Y is a group with a polymerizable group); there are provided the composition and the like containing the crosslinkable polyrotaxane, and a crosslinked material derived from the composition, as well as the method for manufacturing those. COPYRIGHT: (C)2011,JPO&INPIT