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发明名称
CHEMICAL VAPOR DEPOSITION APPARATUS
摘要
申请公布号
KR101019530(B1)
申请公布日期
2011.03.09
申请号
KR20080050280
申请日期
2008.05.29
申请人
发明人
分类号
H01L21/205
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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ELECTROGENOUS SITE GROUP
TORQUE REDUCTION DEVICE FOR AIR-COMPRESSING INJECTION COMBUSTION ENGINES IN VEHICLES WITH AN ANTISKID PROPULSION CONTROL
SINGLE-PHASE SYNCHRONOUS MOTOR WITH A BIPOLAR PERMANENT-MAGNET EXCITED ROTOR
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SMALL WATERCRAFT
VERTICALLY ACCUMULATING STORAGE AND DISPENSING APPARATUS
TAMPING UNIT WITH VIBRATORY AND ADJUSTABLE TAMPING TOOLS FOR A TRAVELLING TAMPING MACHINE, AND APPARATUS FOR DRIVING THE TAMPING UNIT
OPTICAL LOW PASS FILTER
PROCESS FOR THE DEPOSIT OF SILICON COMPOUND OPTICAL LAYERS BY CATHODIC SPUTTERING, AND SPUTTER CATHODE FOR THIS PROCESS