发明名称 SEMICONDUCTOR SURFACE PREPARATION ULTRAVIOLET INVESTIGATION SYSTEM
摘要 PURPOSE: An ultraviolet irradiating device for processing a semiconductor surface is provided to suppress interference of rays emitted from an ultraviolet lamp, thereby increasing reflectivity of rays emitted from the ultraviolet lamp. CONSTITUTION: Both ends and the bottom of a housing(110) are opened. A separating space unit is formed on one end of a heat emitting member(130). An ultraviolet lamp(150) irradiates an ultraviolet ray on a semiconductor surface. A reflecting plate(160) has a bent section corresponding to the front side of the heat emitting member. A fixing bracket(170) is fixed to the heat emitting member.
申请公布号 KR20110024772(A) 申请公布日期 2011.03.09
申请号 KR20090082907 申请日期 2009.09.03
申请人 LICHTZEN CO., LTD. 发明人 KIM, YOUNG NAM;YUN, JEONG YEOB
分类号 H01L21/02;H01L21/302 主分类号 H01L21/02
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