| 摘要 |
PURPOSE: A resist composition and a method for forming a resist pattern are provided to secure the quality of the resist pattern. CONSTITUTION: A resist composition includes a component, an acid generating component, a nitrogen-contained organic compound. The solubility of the component with respect to an alkaline developing agent is variable by the action of acid. The acid generating component generates acid by an exposure process. The nitrogen-contained organic compound is represented by a general formula d1. In the general formula d1, R20 represents a methylene group, ethylene group, oxygen atom, or -C(CH_3)_2-, R21 represents a hydrogen atom or an organic group, and R22 represents an alkoxy group, an alkoxycarbonyloxy group, a hydroxyl group, a halogen atom, -C(=O)-O-R23, -C(=O)-NR-R23, or a carboxyl group. |
