发明名称 SUBSTRATE ETCHING METHOD AND SYSTEM USING THE SHEET VIBRATION
摘要 PURPOSE: A method and an apparatus for etching a substrate with a sheet vibration are provided to improve the thickness uniformity of a glass substrate by efficiently removing sludge through the forcible vibration of a sheet. CONSTITUTION: A process bath(3-10) receives chemical. An inlet(3-20) passes through a pipe and inputs the chemical to the process bath. An outlet(3-30) passes through a pipe and discharges the chemical to the outside of the process bath. A sheet(3-60) forms the forcible flow of the chemical. A sheet fixing frame(3-70) vibrates the sheet with external power.
申请公布号 KR20110024693(A) 申请公布日期 2011.03.09
申请号 KR20090082807 申请日期 2009.09.03
申请人 KIM, CHUL HA 发明人 KIM, CHUL HA
分类号 H01L21/3063 主分类号 H01L21/3063
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