| 摘要 |
<p>PURPOSE: A developing device and a developing method are provided to reduce non-uniformity in a developing process by setting a transfer speed of a substrate with a discharge timing of developers from a second development nozzle. CONSTITUTION: A first development nozzle coats developers from the front to the rear of a substrate transferred on a transfer path. A substrate information obtaining unit(20) obtains information about a substrate process. A second development nozzle(13) moves along the transfer path of the lower side of the first development nozzle. A nozzle moving unit moves the second development nozzle. A control unit(25) controls the driving of the nozzle moving unit and the second development nozzle.</p> |
