SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to prevent the quality degradation of a substrate by preventing the misalignment of the substrate. CONSTITUTION: A chamber(10) comprises a space and a gate for inputting and outputting a substrate. A plurality of receiving units which receive the substrate are formed around a susceptor(20). A lift pin hole is formed at each receiving unit and is lifted and rotated in a space of a chamber. A plurality of lift pins are lifted in the lift pin hole and support the substrate in loading and unloading processes. A gas supply unit sprays process gas to the substrate. A support plate(40) is arranged on the lower side of the susceptor and supports the lift pin.