发明名称 MASKLESS LITHOGRAPHY USING RASTERIZATION OF MASSIVE POLYGONS
摘要 <p>PURPOSE: A maskless exposure method using rasterization of massive polygons is provided to efficiently transmit data by transmitting only the information with an event to change the operation state of point light. CONSTITUTION: A substrate is exposed by using a lot of point light(12). A repeated pattern instance is extracted from an inputted pattern. Slabs are generated by dividing a polygon(20) of the pattern instance in parallel to a scan direction. Scan pieces that are sections for turning on the point light are calculated from the slabs every scan line(13) through which the point light passes in the pattern instance. Scan data with the position information of the scan pieces is generated.</p>
申请公布号 KR20110024007(A) 申请公布日期 2011.03.09
申请号 KR20090081843 申请日期 2009.09.01
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 SHIN, HA YONG;SHIN, YONG CHEOL;YI, IL LANG;PARK, SE YOUND;JEONG, BYUNG DUK
分类号 H01L21/027 主分类号 H01L21/027
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