GAS INJECTING DEVICE AND SUBSTRATE PROCESSING APPARATUS USING THE SAME

摘要

PURPOSE: A gas spraying device and a substrate processing device using the same are provided to uniformly supply gas to the entire area of a substrate by separating a gas diffusion space in a gas spraying unit and independently supplying process gas to a separated space. CONSTITUTION: A gas spraying unit is rotatably installed in a chamber(10). The gas spraying unit is installed on the upper side of a substrate support unit(20) and sprays process gas to a substrate. A plurality of gas spraying unit include a top plate(50), a spray plate(70), and a partition(79). The spray plate includes a plurality of gas spraying holes on the lower side of a gas diffusion space. The partition is installed between the top plate and the spray plate.