METHOD FOR IMPROVEMENT IN PLASMA UNIFORMITY OF PLASMA SOURCE

摘要

PURPOSE: A method for generating plasma to increase plasma uniformity is provided to control an antenna installed in a plasma reactor and an external insulating body and a location of the antenna, thereby preventing sputtered insulating materials. CONSTITUTION: The first insulator(300) of a fixed length surrounds the outer circumference of an antenna(200) inserted into a plasma reactor. The first insulator protects the antenna from plasma. The second insulator(310) surrounds a fixed length of the first insulator. The second insulator controls capacitive coupling. The antenna is made of copper materials. The first insulator and the second insulator are made of quartz or alumina.