| 摘要 |
PURPOSE: A photosensitive resin composition is provided to improve the chemical-resistivity and the heat-resistivity by introducing a multifunctional acrylic monomer in a specific structure with a carboxylic group and a multifunctional acrylic compound in a specific structure without the carboxylic group. CONSTITUTION: A photosensitive resin composition includes an alkaline soluble copolymer, a photo-polymerization compound, a photo-polymerization initiator, a compound represented by chemical formula 1, and a solvent. In chemical formula 1, A represents a group represented by chemical formula 2, Y represents a group represented by chemical formula 2 or chemical formula 3, and R represents C1-C4 alkylene group, benzylene group, or cyclohexylene group. |
