发明名称 |
ILLUMINATION OPTICAL APPARATUS, PROJECTION EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND BIREFRINGENT MEMBER |
摘要 |
<p>An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system (ILS) for illuminating a reticle (R) with an illumination light (IL) and a projection optical system (PL) for projecting the pattern image of the reticle (R) onto a wafer (W) are provided. An illumination light (IL) emitted from an exposure light source (1) in a linearly polarized state in the illumination optical system (ILS) passes through first and second birefringent members (12, 13) having different fast axis directions and is converted into a polarized state that is substantially linearly polarized in a circumferential direction with the optical axis as the center in an almost specific annular area, and them illuminates the reticle (R) under an annular illuminating condition after passing through a fly-eye lens (14).</p> |
申请公布号 |
KR101020378(B1) |
申请公布日期 |
2011.03.08 |
申请号 |
KR20087019082 |
申请日期 |
2004.10.26 |
申请人 |
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发明人 |
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分类号 |
H01L21/027;G02B19/00;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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