| 摘要 |
Diffractive patterns are disposed on a MEMS substrate in the gaps between the MEMS micromirrors to reduce backreflection of light leaking through the gaps and reflected by the MEMS substrate. The diffractive patterns are silicon surface-relief diffraction gratings or silicon oxide gratings on silicon substrate. Sub-wavelength gratings are used to suppress higher orders of diffraction; 50% duty cycle surface relief gratings on a substrate having index of refraction close to 3 are used to suppress both reflected and transmitted zero orders of diffraction simultaneously. The gratings have lines running parallel or at a slight angle to the gaps, to prevent the diffracted light from re-entering the gaps.
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