发明名称 Dicing method for semiconductor substrate
摘要 A method for dicing a semiconductor substrate includes: forming a reforming layer in the substrate by irradiating a laser beam on the substrate; forming a groove on the substrate along with a cutting line; and applying a force to the substrate in order to cutting the substrate at the reforming layer as a starting point of cutting. The groove has a predetermined depth so that the groove is disposed near the reforming layer, and the force provides a stress at the groove.
申请公布号 US7901967(B2) 申请公布日期 2011.03.08
申请号 US20060600136 申请日期 2006.11.16
申请人 DENSO CORPORATION 发明人 KOMURA ATSUSHI;TAMURA MUNEO;SUGIURA KAZUHIKO;FUNATO HIROTSUGU;MARUYAMA YUMI;FUJII TETSUO;KOHNO KENJI
分类号 H01L21/00 主分类号 H01L21/00
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