POSITIVE TYPED PHOTOSENSITIVE COMPOSITION

摘要

PURPOSE: A positive typed photosensitive composition is provided to prevent the damage of a semiconductor caused by a low temperature by performing a crosslinking reaction at a low temperature. CONSTITUTION: A positive typed photosensitive composition comprises polyamide derivatives represented by chemical formula (1). In chemical formula (1), R^1, R^2, R^4 and R^5 are independently divalent - hexavalent aryl group with at least two carbon numbers; R^3 is hydrogen atom or alkenyl group of carbon number 1-10; k is an integer of 10-1000; l is an integer of 1-1000; n and m are respectively an integer of 0-2; and X is hydrogen atom or aryl group of carbon number 2-30.