发明名称 Methods for partially removing circuit patterns from a multi-project wafer
摘要 Disclosed are a method and a system for partially removing circuit patterns from a multi-project wafer. This method and this system can be used to provide a multi-project-wafer to a user without disclosing proprietary circuit information of other customers. At least one integrated circuit design of a user is identified from a plurality of integrated circuit designs of a plurality of users. Those unidentified circuits can be totally removed through circuit removing method. Then the modified multi-project wafer can be delivered to the user without concerns about disclosing information of unidentified circuits which belongs to other customers. In one embodiment, a laser system may be used to totally remove the unidentified integrated circuit designs without impacting the circuit performance of identified circuits. In another embodiment, a diamond-blade saw may also be used to totally remove the unidentified integrated circuit designs without impacting the circuit performance of identified circuits.
申请公布号 US7904855(B2) 申请公布日期 2011.03.08
申请号 US20060536927 申请日期 2006.09.29
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 TSENG YI-HONG;WU KUAN-LIANG
分类号 G06F17/50;H01L21/00 主分类号 G06F17/50
代理机构 代理人
主权项
地址