| 摘要 |
<p>PURPOSE: A two-side exposing device is provided to shorten process time by reversing an exposed work with a reverse stage unit and simultaneously replacing a first mask and a second mask. CONSTITUTION: A work transferred by a work input and output unit(20) is transferred to a work stage(4). A pattern formed on the mask for exposing a first surface from a mask library is exposed to the work. The work is reversed in a reverse stage unit(30) and is stored in a work storage unit. The first surfaces of all works of a first lot are exposed. The mask is replaced with the mask for exposing a second surface. The work which finishes the exposure of the first surface is outputted from the work storage unit and the second surface of the work is exposed.</p> |
