发明名称 Methods for discretized formation of masking and capping layers on a substrate
摘要 The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used in integrated circuit fabrication. A substrate having an array of differentially processed regions thereon is processed by delivering materials to or modifying regions of the substrate.
申请公布号 US7902063(B2) 申请公布日期 2011.03.08
申请号 US20060352083 申请日期 2006.02.10
申请人 INTERMOLECULAR, INC. 发明人 CHIANG TONY P.;LAZOVSKY DAVID E.;BOUSSIE THOMAS R.;GORER ALEXANDER
分类号 H01L21/4763 主分类号 H01L21/4763
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