发明名称 Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object
摘要 An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.
申请公布号 US7903866(B2) 申请公布日期 2011.03.08
申请号 US20070730190 申请日期 2007.03.29
申请人 ASML NETHERLANDS B.V. 发明人 VAN DER WIJST MARC WILHELMUS MARIA;VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS;ZAAL KOEN JACOBUS JOHANNES MARIA
分类号 G06K9/00 主分类号 G06K9/00
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