发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND POLYHYDROXYAMIDE RESIN
摘要 Disclosed is a positive photosensitive resin composition having excellent electrical insulation properties, heat resistance, mechanical strength and electrical characteristics, which is capable of forming a high-resolution circuit pattern. The positive photosensitive resin is characterized by containing at least one kind of polyhydroxyamide resin (A) containing a repeating unit represented by formula (1) and having a weight average molecular weight of 3,000-20,000, and a compound (B) which generates an acid by the action of light. (In the formula, X represents a tetravalent aliphatic group or aromatic group; R1 and R2 independently represent a hydrogen atom or an alkyl group having 1-10 carbon atoms; Ar1 and Ar2 independently represent an aromatic group; Y represents an organic group containing at least one aromatic group substituted by a carboxyl group; n represents an integer of not less than 1; and l and m independently represent 0 or an integer of not less than 1 and satisfy l + m = 2.)
申请公布号 KR20110022730(A) 申请公布日期 2011.03.07
申请号 KR20117002867 申请日期 2009.07.08
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 EBARA KAZUYA;SUZUKI HIDEO;TAMURA TAKAYUKI
分类号 G03F7/039;C08G69/26;G03F7/023 主分类号 G03F7/039
代理机构 代理人
主权项
地址