| 摘要 |
<p>PURPOSE: A coating method, computer storage medium and a coating apparatus are provided to prevent coating stain of resist liquid by rotating a wafer with the second number of rotation. CONSTITUTION: A coating method of applying a coating solution on a substrate comprises: a first step of rotating the substrate at a first rotation number; a second step of subsequently decelerating the rotation of the substrate and rotating the substrate at a second rotation number lower than the first rotation number; a third step of subsequently further decelerating the rotation of the substrate and rotating the substrate at a third rotation number lower than the second rotation number; and a fourth step of subsequently accelerating the rotation of the substrate and rotating the substrate at a fourth rotation number higher than the third rotation number, wherein supply of the coating solution to a center portion of the substrate is continuously performed from said first step to a middle of said third step, and wherein the second rotation number is 1500 rpm to 2000 rpm.</p> |
