| 摘要 |
To provide a photocurable composition whereby it is possible to obtain a cured product provided with both release property and high refractive index, and a process whereby it is possible to produce a molded product having a high refractive index and having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. A photocurable composition comprising from 61 to 90 mass% of a compound (A) having a refractive index of at least 1.55 at a wavelength of 589 nm before curing and having at least two (meth)acryloyloxy groups, from 2 to 15 mass% of a compound (B) having fluorine atoms and at least one carbon-carbon unsaturated double bond (provided that the compound (A) is excluded), from 5 to 35 mass% of a compound (C) having one (meth)acryloyloxy group (provided that the compound (B) is excluded), and from 1 to 12 mass% of a photopolymerization initiator (D) (provided (A)+ (B)+ (C)+(D)=100 mass%). |
