发明名称 EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD USING SAME
摘要 <p>PURPOSE: An exposure apparatus and a method for manufacturing a device using the same are provided to reduce the time required for replacing a disk by preparing a second disk used for the next exposure treatment after a first exposure treatment using a first disk. CONSTITUTION: An exposure apparatus comprises a stoker, a conveyance path(7), and a disk exchange device. The stoker stores a plurality of disks. The conveyance path sends back a disk to a disk stage. The disk exchange device comprises carriages(9a,9b) and a load chamber(8). The carriage has a hand(11) which keeps the disk. The load chamber is installed beneath the conveyance path. The second disk is loaded in the load chamber by conveying a second disk used for second exposure treatment during a first exposure treatment using a first disk.</p>
申请公布号 KR20110021653(A) 申请公布日期 2011.03.04
申请号 KR20100077244 申请日期 2010.08.11
申请人 CANON KABUSHIKI KAISHA 发明人 TAKAHASHI AKIHIRO
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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