发明名称 |
3 DIMENSION MEMS STRUCTURE AND MANUFACTURING METHOD OF THE SAME |
摘要 |
<p>PURPOSE: A 3d MEMS structure equipped and a manufacturing method thereof are provided to accurately control the height of the level formed on the 3d MEMS structure by implementing the patterning or etching process in multiple stages. CONSTITUTION: A first etching mask(210) is deposited on a substrate(200). The substrate is exposed by etching the area of the first etching mask. A groove(H) is formed by partially etching the area of the substrate exposed through the first etching mask. A second etching mask(240) is deposited on the sidewall of the groove.</p> |
申请公布号 |
KR20110021635(A) |
申请公布日期 |
2011.03.04 |
申请号 |
KR20100042320 |
申请日期 |
2010.05.06 |
申请人 |
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
JE, CHANG HAN |
分类号 |
H01L21/308;H01L21/027 |
主分类号 |
H01L21/308 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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