发明名称 3 DIMENSION MEMS STRUCTURE AND MANUFACTURING METHOD OF THE SAME
摘要 <p>PURPOSE: A 3d MEMS structure equipped and a manufacturing method thereof are provided to accurately control the height of the level formed on the 3d MEMS structure by implementing the patterning or etching process in multiple stages. CONSTITUTION: A first etching mask(210) is deposited on a substrate(200). The substrate is exposed by etching the area of the first etching mask. A groove(H) is formed by partially etching the area of the substrate exposed through the first etching mask. A second etching mask(240) is deposited on the sidewall of the groove.</p>
申请公布号 KR20110021635(A) 申请公布日期 2011.03.04
申请号 KR20100042320 申请日期 2010.05.06
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 JE, CHANG HAN
分类号 H01L21/308;H01L21/027 主分类号 H01L21/308
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