发明名称 NON-VOLATILE MEMORY CELL AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>PURPOSE: A nonvolatile memory cell and a manufacturing method thereof are provided to reduce the additional packaging expense by mounting the memory transistor inside the system and omitting the external memory. CONSTITUTION: A memory transistor including a semiconductor film(204A), a buffer layer(206A), an organic ferroelectric film(208A), and a gate electrode(214) is formed on a substrate(200). A driving transistor including the semiconductor film, a buffer layer, a gate insulating layer(209A), and a gate electrode is formed on the top of the substrate. The buffer layer is interposed between the semiconductor film and the organic ferroelectric film.</p>
申请公布号 KR20110021632(A) 申请公布日期 2011.03.04
申请号 KR20100029135 申请日期 2010.03.31
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 YOON, SUNG MIN;BYUN, CHUN WON;YANG, SHIN HYUK;PARK, SANG HEE;JUNG, SOON WON;KANG, SEUNG YOUL;HWANG, CHI SUN;YU, BYOUNG GON
分类号 H01L27/115;H01L21/8242;H01L29/786 主分类号 H01L27/115
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