发明名称 |
NON-VOLATILE MEMORY CELL AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>PURPOSE: A nonvolatile memory cell and a manufacturing method thereof are provided to reduce the additional packaging expense by mounting the memory transistor inside the system and omitting the external memory. CONSTITUTION: A memory transistor including a semiconductor film(204A), a buffer layer(206A), an organic ferroelectric film(208A), and a gate electrode(214) is formed on a substrate(200). A driving transistor including the semiconductor film, a buffer layer, a gate insulating layer(209A), and a gate electrode is formed on the top of the substrate. The buffer layer is interposed between the semiconductor film and the organic ferroelectric film.</p> |
申请公布号 |
KR20110021632(A) |
申请公布日期 |
2011.03.04 |
申请号 |
KR20100029135 |
申请日期 |
2010.03.31 |
申请人 |
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
YOON, SUNG MIN;BYUN, CHUN WON;YANG, SHIN HYUK;PARK, SANG HEE;JUNG, SOON WON;KANG, SEUNG YOUL;HWANG, CHI SUN;YU, BYOUNG GON |
分类号 |
H01L27/115;H01L21/8242;H01L29/786 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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