EXPOSURE DEVICE, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: An exposure device, an exposing method, and a semiconductor device manufacturing method are provided to correct the transcription pattern during the exposure with enough accuracy by offering the proximity information of the particular transcription pattern and the particular value information of the relative position between particular transcription patterns to the exposure device. CONSTITUTION: A light intensity distribution detecting unit(21) detects the distribution of light intensity of the light projected through the photomask. A specific transcript pattern determining unit(22) decides specific transcription patterns for more than two unit patterns. An error calculation unit(23) calculates the error between the specific transcription pattern and the transcription pattern.