发明名称 SUBSTRATE PROCESSING APPARATUS HAVING CHEMICALS SUPPLYING DEVICE
摘要 PURPOSE: A substrate processing apparatus equipped with the chemical solution supplying device is provided to increase the utility of the space by omitting the additional space for installing the chemical supplying device. CONSTITUTION: A body frame(10) is formed in the rectangular shape. A first door(17) is installed in the body frame and opens the receiving portion. A processing unit(30) comprises a first process station(31) and a second process station(32) which are arranged on both sides of the conveying path. A robot arm loads and unloads the substrate into the first process station and the second process station.
申请公布号 KR20110021520(A) 申请公布日期 2011.03.04
申请号 KR20090079368 申请日期 2009.08.26
申请人 CND PLUS CO., LTD. 发明人 YOO, YONG SU;KIM, JONG HO
分类号 H01L21/208;H01L21/027 主分类号 H01L21/208
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