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发明名称
Isolation valve for CVD process of semiconductor
摘要
申请公布号
KR101017836(B1)
申请公布日期
2011.03.04
申请号
KR20080079974
申请日期
2008.08.14
申请人
发明人
分类号
H01L21/02;H01L21/00
主分类号
H01L21/02
代理机构
代理人
主权项
地址
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