| 摘要 |
PURPOSE: A substrate processing apparatus is provided to enable the separate temperature control of a focus ring by individually comprising a cooling fluid path supplying cooling gas to the bottom of the cooling fluid path and the focus ring. CONSTITUTION: A chamber(110) comprises a space for implementing the process of a substrate. An electrostatic chuck(120), having a disk shape, sucks and supports the substrate. A focus ring(130) surrounds the edge area of a substrate supported by the electrostatic chuck. A first cooling fluid path(140) supplies the cooling gas for controlling the temperature to the bottom of the substrate supported by the electrostatic chuck.
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