TREATMENT APPARATUS AND METHOD FOR WAFER WASTE WATER
摘要
PURPOSE: A processing apparatus for wafer fabrication wastewater, and a processing method thereof are provided to recycle the fabrication wastewater generated from cutting a wafer. CONSTITUTION: A processing apparatus for wafer fabrication wastewater comprises the following: a wastewater storage tank(10) for storing waste water; a filter unit(20) filtering the wastewater using a hollow fiber separation film; a filtrate storage tank(30) storing filtrate obtained by passing the wastewater through the hollow fiber separation film; and an air compressor for washing the filter unit.
申请公布号
KR101019032(B1)
申请公布日期
2011.03.04
申请号
KR20100082024
申请日期
2010.08.24
申请人
CHEMICORE LNC.;SYNOPEX CO., LTD.D
发明人
KIM, SUNG SOO;KWEON, HEOUG YOON;PARK, BYUNG JAE;KIM, NAM HO;PARK, JIN TAE