NONVOLATILE MEMORY DEVICE AND METHOD OF FORMING THE SAME
摘要
<p>PURPOSE: A non-volatile memory and a forming method thereof are provided to improve the retention property of a device by alleviating the electrical field applied to the edge of the active area by comprising a barrier capping layer. CONSTITUTION: A semiconductor substrate(100) including an element separation layer(105) is prepared for defining the active area. A tunnel insulating layer(110) is formed on the semiconductor substrate of the active area. A charge trapping layer(120) is formed on the tunnel insulating layer. A blocking insulation film(140) is formed on the charge trapping layer and the element isolation film.</p>
申请公布号
KR20110021238(A)
申请公布日期
2011.03.04
申请号
KR20090078906
申请日期
2009.08.25
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
YANG, JUN KYU;AHN, JAE YOUNG;PARK, YOUNG GEUN;HWANG, KI HYUN;SHIN, DONG WOON;LEE, JU YUL