发明名称 |
COATING TREATMENT METHOD, COMPUTER STORAGE MEDIUM, AND COATING TREATMENT APPARATUS |
摘要 |
A substrate is rotated at a first rotation number (first step). The rotation of the substrate is decelerated to 1500 rpm that is a second rotation number and the substrate is rotated at the second rotation number for 0.5 seconds (second step). The rotation of the substrate is further decelerated to a third rotation number and the substrate is rotated at the third rotation number (third step). The rotation of the substrate is accelerated to a fourth rotation number and the substrate is rotated at the fourth rotation number (fourth step). A resist solution is continuously supplied to a center portion of the substrate from a middle of the first step to a middle of the third step.
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申请公布号 |
US2011052807(A1) |
申请公布日期 |
2011.03.03 |
申请号 |
US20100855259 |
申请日期 |
2010.08.12 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
ICHINO KATSUNORI;TAKAYANAGI KOJI;NODA TOMOHIRO |
分类号 |
B05D3/12;B05C5/00;B05C13/00 |
主分类号 |
B05D3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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