发明名称 APPARATUS AND METHOD FOR INSPECTING DEFECT
摘要 <p>Disclosed is a defect inspecting apparatus which is provided with: an illuminating optical system which radiates light, under predetermined optical conditions, to a subject to be inspected; a detection optical system, which detects, under predetermined detection conditions, the light which has been radiated by means of the illuminating optical system and scattered from the subject to be inspected, and which obtains image data; and an image processing section provided with a defect candidate detecting section, which detects a defect candidate from each of the plurality of image data obtained by means of the detection optical system under different conditions, and a post-inspection processing section, which integrates the defect candidates of the plurality of image data and determines a defect.</p>
申请公布号 WO2011024362(A1) 申请公布日期 2011.03.03
申请号 WO2010JP04073 申请日期 2010.06.18
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION;SAKAI, KAORU;URANO, TAKAHIRO 发明人 SAKAI, KAORU;URANO, TAKAHIRO
分类号 G01N21/956;H01L21/66 主分类号 G01N21/956
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